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Contact PUF: Highly Stable Physical Unclonable Functions Based on Contact Failure Probability in 180 nm, 130 nm, and 28 nm CMOS Processes.
Duhyun Jeon
Dongmin Lee
Dong Kyue Kim
Byong-Deok Choi
Published in:
HOST (2022)
Keyphrases
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silicon on insulator
cmos technology
metal oxide semiconductor
mobile devices
low cost
data sets
real world
search engine
high resolution
high speed
nm technology