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A Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing.
Tung-Ho Lin
Min-Hsiung Hung
Rung-Chuan Lin
Fan-Tien Cheng
Published in:
ICRA (2006)
Keyphrases
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semiconductor manufacturing
process control
discrete event simulation
control system
virtual world
augmented reality
neural network
virtual reality
multistage
production system
recognition scheme
real time
information retrieval
expert systems
virtual environment
single view