A Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing.

Tung-Ho Lin Min-Hsiung Hung Rung-Chuan Lin Fan-Tien Cheng

Published in: ICRA (2006)

Keyphrases

semiconductor manufacturing
process control
discrete event simulation
control system
virtual world
augmented reality
neural network
virtual reality
multistage
production system
recognition scheme
real time
information retrieval
expert systems
virtual environment
single view