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Ultra-thin oxides on silicon fabricated using ultra-slow multicharged ion beams.

G. BorsoniN. BéchuM. Gros-JeanMichael L. Korwin-PawlowskiR. LaffitteV. Le RouxL. VallierN. RochatC. Wyon
Published in: Microelectron. Reliab. (2001)
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