Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability.

T. Ali Ricardo Olivo S. Kerdilès David Lehninger Maximilian Lederer D. Sourav A.-S. Royet Ayse Sünbül A. Prabhu Kati Kühnel Malte Czernohorsky M. Rudolph R. Hoffmann Christelle Charpin-Nicolle Laurent Grenouillet Thomas Kämpfe Konrad Seidel

Published in: IMW (2022)

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