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Formation of high resistivity phases of nickel silicide at small area.

Ryuji TomitaHidehiko KimuraM. YasudaK. MaedaS. UenoT. TomizawaY. KunimuneH. NakamuraM. MoritokiHiroshi Iwai
Published in: Microelectron. Reliab. (2013)
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