Effective work-function control technique applicable to p-type FinFET high-k/metal gate devices.
Shimpei YamaguchiZeynel BayindirXiaoli HeSuresh UppalPurushothaman SrinivasanChloe YongDongil ChoiManoj JoshiHyuck Soo YangOwen HuSrikanth SamavedamDong Kyun SohnPublished in: Microelectron. Reliab. (2017)