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Optical characterization of integrated P+/N-Well/P-substrate and N-Well/P-substrate photo-device structures on CMOS technology.

Gelacio Castillo-CabreraJ. Garcia-LamontMario Alfredo Reyes-BarrancaJose Antonio Moreno-CadenasA. Escobosa-Echavarria
Published in: CCE (2010)
Keyphrases
  • semiconductor devices
  • cmos technology
  • electron beam
  • low power
  • power consumption
  • low voltage
  • image processing
  • signal processing
  • space time
  • image sensor