Deep-amorphization and solid-phase epitaxial regrowth processes for hybrid orientation technologies in SOI MOSFETs with thin body.
Akiko OhataYoung-Ho BaeSorin CristoloveanuThomas SignamarcheixJ. WidiezBruno GhyselenOlivier FaynotLaurent ClavelierPublished in: Microelectron. Reliab. (2012)