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An 0.8-μm high-voltage IC using a newly designed 600-V lateral p-channel dual-action device on SOI.

Kiyoto WatabeHajime AkiyamaTomohide TerashimaMasakazu OkadaShinji NobutoMasao YamawakiSotoju Asa
Published in: IEEE J. Solid State Circuits (1998)
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