A Realizable Overlay Virtual Metrology System in Semiconductor Manufacturing: Proposal, Challenges and Future Perspective.
Tze Chiang TinSaw Chin TanHing YongJimmy Ook Hyun KimEric Ken Yong TeoChing Kwang LeePeter ThanAngela Pei San TanSiew Chee PhangPublished in: IEEE Access (2021)
Keyphrases
- semiconductor manufacturing
- process control
- discrete event simulation
- paradigm shift
- lessons learned
- real world
- neural network
- viewpoint
- augmented reality
- open issues
- future trends
- control system
- long term
- technical challenges
- information systems
- promising directions
- current issues
- production system
- case study
- artificial intelligence
- data sets
- grand challenges