Predicting Time-to-Failure of Plasma Etching Equipment using Machine Learning.

Anahid N. Jalali Clemens Heistracher Alexander Schindler Bernhard Haslhofer Tanja Nemeth Robert Glawar Wilfried Sihn Peter De Boer

Published in: ICPHM (2019)

Keyphrases

machine learning
plasma etching
machine learning methods
machine learning and data mining
data analysis
machine learning approaches
machine learning algorithms

artificial intelligence
computer vision
active learning
knowledge acquisition
support vector machine
real time
knowledge discovery

pattern recognition
feature selection
computational intelligence
knowledge representation
model selection
learning systems
reinforcement learning

learning problems
inductive learning
database systems
thin film
supervised machine learning
data mining