Predicting Time-to-Failure of Plasma Etching Equipment using Machine Learning.
Anahid N. JalaliClemens HeistracherAlexander SchindlerBernhard HaslhoferTanja NemethRobert GlawarWilfried SihnPeter De BoerPublished in: ICPHM (2019)
Keyphrases
- machine learning
- plasma etching
- machine learning methods
- machine learning and data mining
- data analysis
- machine learning approaches
- machine learning algorithms
- artificial intelligence
- computer vision
- active learning
- knowledge acquisition
- support vector machine
- real time
- knowledge discovery
- pattern recognition
- feature selection
- computational intelligence
- knowledge representation
- model selection
- learning systems
- reinforcement learning
- learning problems
- inductive learning
- database systems
- thin film
- supervised machine learning
- data mining