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Predicting Time-to-Failure of Plasma Etching Equipment using Machine Learning.
Anahid N. Jalali
Clemens Heistracher
Alexander Schindler
Bernhard Haslhofer
Tanja Nemeth
Robert Glawar
Wilfried Sihn
Peter De Boer
Published in:
ICPHM (2019)
Keyphrases
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machine learning
plasma etching
machine learning methods
machine learning and data mining
data analysis
machine learning approaches
machine learning algorithms
artificial intelligence
computer vision
active learning
knowledge acquisition
support vector machine
real time
knowledge discovery
pattern recognition
feature selection
computational intelligence
knowledge representation
model selection
learning systems
reinforcement learning
learning problems
inductive learning
database systems
thin film
supervised machine learning
data mining