Highly reliable TaOx ReRAM with centralized filament for 28-nm embedded application.
Yukio HayakawaAtsushi HimenoRyutaro YasuharaW. BoullartE. VecchioT. VandeweyerT. WittersD. CrottiM. JurczakS. FujiiS. ItoY. KawashimaYuuichirou IkedaAkifumi KawaharaKen KawaiZhiqiang WeiShunsaku MuraokaKazuhiko ShimakawaTakumi MikawaShinichi YonedaPublished in: VLSIC (2015)