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A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.

Jae-Seok YangKatrina LuMinsik ChoKun YuanDavid Z. Pan
Published in: ASP-DAC (2010)
Keyphrases
  • graph theoretic
  • multi objective
  • main contribution
  • evolutionary algorithm
  • neural network
  • optimization algorithm
  • graph theory
  • probabilistic model
  • simulated annealing
  • integrated circuit
  • graph properties