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Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using a Two-Dimensional Device Simulator.
Tetsuo Endoh
Yuto Momma
Published in:
IEICE Trans. Electron. (2007)
Keyphrases
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metal oxide semiconductor
empirical studies
three dimensional
cost effective
future development
silicon on insulator
statistical analysis
key technologies
smart spaces
cmos technology