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Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2.

Young-Seok LeeSi-Jun KimJang-Jae LeeChul-Hee ChoIn-Ho SeongShin-Jae You
Published in: Sensors (2022)
Keyphrases
  • plasma etching
  • real time
  • neural network
  • evolutionary algorithm
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  • artificial neural networks
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