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Optimum design of a large area, flexure based XYθ mask alignment stage for a 12-inch wafer using grey relation analysis.
Changkyu Lee
Jae Woong Lee
Sang Gil Ryu
Je Hoon Oh
Published in:
Robotics Comput. Integr. Manuf. (2019)
Keyphrases
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optimum design
computational intelligence
image analysis
grey relation