Robust via-programmable ROM design based on 45nm process considering process variation and enhancement Vmin and yield.
Byung-Jun JangChan-Ho LeeSung-Hun SimKyu-Won ChoiDo-Hun ByunYeon-Ho JungKi-Man ParkDong-Yeon HeoGyu-Hong KimJoon-Sung YangPublished in: ISCAS (2015)