F. Assion

Publication Activity (10 Years)

Years Active: 2011-2013
Publications (10 Years): 0

Top Topics

Application Layer

Integrated Circuit

Top Venues

Publications

Ulrich Hilleringmann, Marcel Schönhoff, F. Assion
Titanium disilicide as hot side metallization layer for thermoelectric generators. AFRICON (2013)
Ulrich Hilleringmann, K. Wolff, F. Assion, Fábio Fedrizzi Vidor, Gilson I. Wirth
Semiconductor nanoparticles for electronic device integration on foils. AFRICON (2011)