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A virtual metrology approach for maintenance compensation to improve yield in semiconductor manufacturing.

Kuo-Yi LinChia-Yu HsuHui-Chun Yu
Published in: Int. J. Comput. Intell. Syst. (2014)
Keyphrases
  • semiconductor manufacturing
  • process control
  • augmented reality
  • discrete event simulation
  • genetic algorithm
  • artificial intelligence
  • real time
  • real world
  • three dimensional
  • software engineering
  • virtual environment