A 0.11 mum CMOS technology featuring copper and very low k interconnects with high performance and reliability.
Yoshihiro TakaoHiroshi KudoJunichi MitaniYoshiyuki KotaniSatoshi YamaguchiKeizaburo YoshieKazuo SukegawaNobuhisa NaoriSatoru AsaiMichiari KawanoPublished in: Microelectron. Reliab. (2002)