Improvement of principal component analysis modeling for plasma etch processes through discrete wavelet transform and automatic variable selection.
Daegeun HaDamdae ParkJunmo KooKye Hyun BaekChonghun HanPublished in: Comput. Chem. Eng. (2016)
Keyphrases
- variable selection
- discrete wavelet transform
- principal component analysis
- dimension reduction
- multiresolution
- input variables
- wavelet domain
- cross validation
- high dimensional
- high frequency
- wavelet coefficients
- subband
- model selection
- haar wavelet transform
- dual tree
- dimensionality reduction
- image fusion
- low frequency
- low dimensional
- complex wavelet transform
- high dimensional data
- data sets
- feature space
- motion estimation
- data points
- high resolution
- feature vectors
- feature extraction
- face recognition
- computer vision