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Logic area reduction using the deep trench isolation technique based on 40 nm embedded PCM process.

Yuan DuYong YeWeiliang JingXiaoyun LiZhitang SongBomy Chen
Published in: IEICE Electron. Express (2017)
Keyphrases
  • data sets
  • machine learning
  • genetic algorithm
  • search engine
  • image processing
  • software engineering
  • development process