A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask.
Zhen GengZheng ShiXiaolang YanKai-sheng LuoPublished in: CAD/Graphics (2013)
Keyphrases
- theoretical analysis
- detection algorithm
- times faster
- dynamic programming
- learning algorithm
- matching algorithm
- optimization algorithm
- computational cost
- experimental evaluation
- computational efficiency
- preprocessing
- classification algorithm
- computational complexity
- optimal solution
- data sets
- segmentation algorithm
- expectation maximization
- improved algorithm
- matching process
- np hard
- active contours
- simulated annealing
- clustering method
- energy function
- tree structure
- significant improvement
- k means
- search space
- objective function
- feature selection
- phase shift