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Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method.

Seunghun BaikDong-Jae KwonHongki KangJae Eun JangJaewon JangY. S. KimHyuk-Jun Kwon
Published in: IEEE Access (2020)
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