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Next-generation virtual metrology for semiconductor manufacturing: A feature-based framework.

Kerul SutharDevarshi ShahJin WangQ. Peter He
Published in: Comput. Chem. Eng. (2019)
Keyphrases
  • semiconductor manufacturing
  • machine learning
  • multiscale
  • main contribution
  • conceptual framework
  • neural network
  • real world
  • artificial intelligence
  • three dimensional
  • dynamic programming
  • discrete event simulation