Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography.
Kyosuke MuramatsuHideaki AsakuraKeijiro SuzukiKen TanizawaMunehiro ToyamaMinoru OhtsukaNobuyuki YokoyamaKazuyuki MatsumaroMiyoshi SekiKeiji KoshinoKazuhiro IkedaShu NamikiHitoshi KawashimaHiroyuki TsudaPublished in: IEICE Electron. Express (2015)