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Crosstalk-Induced Delay, Noise, and Interconnect Planarization Implications of Fill Metal in Nanoscale Process Technology.
Arthur Nieuwoudt
Jamil Kawa
Yehia Massoud
Published in:
IEEE Trans. Very Large Scale Integr. Syst. (2010)
Keyphrases
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noise level
design process
process model
rapid development
database
data sets
information technology
signal to noise ratio
noisy images
additive noise