28nm metal-gate high-K CMOS SoC technology for high-performance mobile applications.
S. H. YangJ. Y. SheuM. K. IeongM. H. ChiangT. YamamotoJ. J. LiawS. S. ChangY. M. LinT. L. HsuJ. R. HwangJ. K. TingC. H. WuK. C. TingF. C. YangC. M. LiuI. L. WuY. M. ChenS. J. ChentK. S. ChenJ. Y. ChengM. H. TsaiW. ChangR. ChenC. C. ChenT. L. LeeC. K. LinS. C. YangY. M. SheuJ. T. TzengL. C. LuS. M. JangC. H. DiazYuh-Jier MiiPublished in: CICC (2011)
Keyphrases
- cmos technology
- mobile applications
- low power
- nm technology
- power consumption
- metal oxide semiconductor
- battery life
- embedded dram
- low cost
- silicon on insulator
- high speed
- low voltage
- mobile devices
- context aware
- user experience
- mobile users
- interaction design
- mobile platforms
- m learning
- power dissipation
- mobile phone
- mobile technologies
- parallel processing
- single chip
- mobile environments
- desktop computers
- mobile apps
- location based services
- wireless devices
- mobile platform
- integrated circuit
- hardware and software
- image sensor
- wifi
- smart phones
- mobile services
- end users
- case study