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An effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing.
Kye Hyun Baek
Thomas F. Edgar
Kiwook Song
Gilheyun Choi
Han Ku Cho
Chonghun Han
Published in:
Comput. Chem. Eng. (2014)
Keyphrases
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variable selection
semiconductor manufacturing
cross validation
input variables
high dimensional
model selection
linear models
dimension reduction
stochastic search
discrete event simulation
real time
machine learning
group lasso
sensor networks