On the Topography Simulation of Memory Cell Trenches for Semiconductor Manufacturing Deposition Processes using the Level Set Method.
Clemens HeitzingerSiegfried SelberherrPublished in: ESM (2002)
Keyphrases
- semiconductor manufacturing
- level set method
- discrete event simulation
- level set
- active contours
- image segmentation
- topology preserving
- process control
- narrow band
- active contour model
- discrete event
- piecewise constant
- curve evolution
- deformable models
- numerical methods
- energy functional
- simulation model
- level set evolution
- higher order
- geodesic active contours
- supply chain
- hamilton jacobi
- geometric deformable models
- multistage
- control system