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Design process interactions in shallow trench isolation chemical mechanical planarization for layout diversification and design optimization.

Conrad GuhlSascha BottI. Can AlbayrakAnne WeitzmannRobert KrauseJoscha KappelBirgit ReinholdNan WuMichael ZierAndreas SchüringHongwei MaRico HüselitzBenjamin UhligMarcus Wislicenus
Published in: ICICDT (2021)
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