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Patterning Nanometer Resist Features on Planar and Topography Substrates Using The 2-Step NERIME FIB Top Surface Imaging Process.

Khalil ArshakStephen F. GilmartinDamian CollinsOlga KorostynskaArous Arshak
Published in: ICMENS (2005)
Keyphrases
  • imaging process
  • feature vectors
  • d objects
  • geometric features