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Performance and Reliability of Technology Qualified 34 Mb Split-Gate eFLASH Macro in 28 nm HKMG.

Ralf RichterStefan DünkelBert MüllerFrank MauersbergerSven WittekSven BeyerJana BöhmeUwe RitterVioletta SessiZhen XuMaximilian DrescherJinho KimParviz GhazaviYuri TkachevLatt TeeZonglin LiMandana TadayoniFan LuoNhan DoSerguei JourbaCatherine DecobertGilles FestesBruno VillardThibaut Pate-Cazal
Published in: IMW (2024)
Keyphrases
  • cmos technology
  • nm technology
  • metal oxide semiconductor
  • cost effective
  • power consumption
  • low power
  • real time
  • mobile devices
  • times faster
  • rapid development
  • power dissipation