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Characterization of the Proximity Effect From Tungsten TSVs on 130-nm CMOS Devices in 3-D ICs.
Sangwook Han
David D. Wentzloff
Published in:
IEEE Trans. Very Large Scale Integr. Syst. (2014)
Keyphrases
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low cost
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nm technology
thin film
cmos technology
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metal oxide semiconductor
silicon on insulator