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Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability.

Michael J. MutchThomas PomorskiBrad C. BittelCorey J. CochranePatrick M. LenahanXin LiuRobert J. NemanichJustin BrockmanMarc FrenchMarkus KuhnBenjamin FrenchSean W. King
Published in: Microelectron. Reliab. (2016)
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