Regularized level-set-based inverse lithography algorithm for IC mask synthesis.
Zhen GengZheng ShiXiaolang YanKai-sheng LuoPublished in: J. Zhejiang Univ. Sci. C (2013)
Keyphrases
- computational complexity
- improved algorithm
- preprocessing
- significant improvement
- simulated annealing
- experimental evaluation
- dynamic programming
- cost function
- optimization algorithm
- matching algorithm
- objective function
- theoretical analysis
- computationally efficient
- high accuracy
- total least squares
- detection algorithm
- worst case
- expectation maximization
- learning algorithm
- np hard
- k means
- optimal solution
- least squares
- clustering method
- search space
- times faster
- convergence rate
- face recognition