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BEOL Interconnect Innovation: Materials, Process and Systems Co-optimization for 3nm Node and Beyond.

Gaurav TharejaAshish PalXingye WangSefa DagShi YouShashank SharmaQing ZhuCarmen L. CervantesShinjae HwangMatthew SpullerBen NgPradeep S. KumarNorman TamMax GageSameer DeshpandeZhiyuan WuAlexander JansenLiton DeyFeng ChenXianjin XieKeyvan KashefizadehVinod ReddyAndy LoZhebo ChenSidney HueyJianshe TangHe RenMehul NaikBrian BrownSree KesapragadaBuvna Ayyagari-SangamalliEl Mehdi BaziziXianmin Tang
Published in: VLSI Technology and Circuits (2023)
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