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2×2 multimode interference coupler with low loss using 248 nm photolithography.
Patrick Dumais
Yuming Wei
Ming Li
Fei Zhao
Xin Tu
Jia Jiang
Dritan Celo
Dominic J. Goodwill
Hongyan Fu
Dongyu Geng
Eric Bernier
Published in:
OFC (2016)
Keyphrases
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manufacturing systems
image processing
integrated circuit
high levels
neural network
low cost