A fabrication method for high performance embedded DRAM of 0.18 μm generation and beyond.

T. Yoshida H. Takato T. Sakurai K. Kokubun K. Hiyama A. Nomachi Y. Takasu M. Kishida H. Ohtsuka H. Naruse Y. Morimasa N. Yanagiya T. Hashimoto T. Noguchi T. Miyamae N. Iwabuchi M. Tanaka J. Kumagai H. Ishiuchi

Published in: CICC (2000)

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