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Threshold Voltage Tuning Of 22 nm FD-SOI Devices Fabricated With Metal Gate Last Process.

Cuiqin XuXuejiao WangWei Liu
Published in: ICICDT (2019)
Keyphrases
  • mobile devices
  • high speed
  • design process
  • process model
  • embedded systems
  • fine tuning
  • cmos technology
  • threshold selection
  • high voltage
  • silicon on insulator