Deep Learning Regression of VLSI Plasma Etch Metrology.
Jack KenneyJohn ValcoreScott RiggsEdward A. RietmanPublished in: CoRR (2019)
Keyphrases
- deep learning
- unsupervised learning
- unsupervised feature learning
- mental models
- machine learning
- weakly supervised
- restricted boltzmann machine
- deep architectures
- model selection
- active learning
- data sets
- bayesian networks
- object recognition
- viewpoint
- markov random field
- natural images
- training data
- learning algorithm
- process control
- information retrieval